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Dr Daniel Loch

Postdoctoral Researcher


Summary

Daniel graduated from the Jade University of Applied Sciences in Wilhelmshaven, Germany, as Dipl.-Ing. (FH) in Mechatronics in 2009. After writing his diploma thesis on modulated pulse plasma technology at the Fraunhofer Institute for Surface Technology (IST) in Braunschweig, Germany, he joined Sheffield Hallam University to work on the development of a novel pulsed plasma source. He was awarded the Joint SHU-Fraunhofer IST Research Centre Award in 2016.

About

Daniel is part of the National HIPIMS Technology Centre where he obtained a PhD in Plasma Science and Materials Engineering in 2015. Prior to joining SHU he received his degree as Diplom Ingenieur (FH) in Mechatronics from the Jade University of Applied Sciences in Wilhelmshaven in 2009. He wrote his diploma thesis on reactive plasma process development with modulated pulse plasma technology at the Fraunhofer Institute for Surface Technology (IST) in Braunschweig, Germany.

During his time at SHU he has been developing and characterizing a novel PVD sputtering technique, Inductively Coupled Impulse Sputtering (ICIS). This new highly ionised sputtering technology has shown very promising results for the deposition of magnetic coatings into high aspect ratio structures which are particularly of interest for MagMEMS devices and sensors.

Daniel utilizes Plasma Sampling Mass Spectroscopy (MS) and Optical Emission Spectroscopy (OES) to analyse the plasma composition and Scanning Electron Microscopy (SEM), Energy Dispersive X-ray Spectroscopy (EDX), Raman Spectroscopy, Secondary Ion and Neutral Mass Spectroscopy (SIMS/SNMS) and Profilometry to characterize thin film properties.

In 2016 he received the Joint SHU-Fraunhofer IST Research Centre Award for his work in developing ICIS processes and investigating the plasma properties of ICIS generated plasma.

Publications

Journal articles

Alam, A.E., Olusola, O.I., Loch, D.A.L., Shukla, K., Cranton, W.M., & Dharmadasa, I. (2020). Electrodeposition of ternary compounds for novel PV application and optimisation of electrodeposited CdMnTe thin-films. Scientific Reports, 10 (1), 21445. http://doi.org/10.1038/s41598-020-78066-y

Bower, R., Loch, D., Ware, E., Berenov, A., Zou, B., Hovsepian, P., ... Petrov, P. (2020). Complimentary Metal-Oxide-Semiconductor compatible deposition of nanoscale transition-metal nitride thin films for plasmonic applications. ACS Applied Materials and Interfaces. http://doi.org/10.1021/acsami.0c10570

Biswas, B., Purandare, Y., Arunachalamsugumaran, A., Loch, D., Creasy, S., Khan, I., ... Hovsepian, P. (2017). Defect growth in multilayer chromium nitride/niobium nitride coatings produced by combined high power impulse magnetron sputtering and unbalance magnetron sputtering technique. Thin Solid Films, 636, 558-566. http://doi.org/10.1016/j.tsf.2017.06.027

Loch, D., Aranda Gonzalvo, Y., & Ehiasarian, A. (2017). Plasma analysis of Inductively Coupled Impulse Sputtering of Cu, Ti and Ni. Plasma Sources Science and Technology, 26 (6). http://doi.org/10.1088/1361-6595/aa6f79

Loch, D., & Ehiasarian, A. (2016). Study of the Effect of RF-power and process pressure on the morphology of copper and titanium sputtered by ICIS. Surface and coatings technology, 327, 200-206. http://doi.org/10.1016/j.surfcoat.2016.10.018

Loch, D.A.L., Gonzalvo, Y.A., & Ehiasarian, A.P. (2015). Nickel coatings by Inductively Coupled Impulse Sputtering (ICIS). Surface and coatings technology, 267, 98-104. http://doi.org/10.1016/j.surfcoat.2014.11.029

Hovsepian, P., Arunachalamsugumaran, A., Purandare, Y., Loch, D., & Ehiasarian, A. (2014). Effect of the degree of high power impulse magnetron sputtering utilisation on the structure and properties of TiN films. Thin Solid Films, 562, 132-139. http://doi.org/10.1016/j.tsf.2014.04.002

Lewin, E., Loch, D., Montagne, A., Ehiasarian, A.P., & Patscheider, J. (2013). Comparison of Al–Si–N nanocomposite coatings deposited by HIPIMS and DC magnetron sputtering. Surface and coatings technology, 232, 680-689. http://doi.org/10.1016/j.surfcoat.2013.06.076

Gerdes, H., Bandorf, R., Loch, D., & Bräuer, G. (2012). Reactive Sputter Deposition of Alumina Coatings. IOP Conference Series: Materials Science and Engineering, 39, 012009. http://doi.org/10.1088/1757-899x/39/1/012009

Conference papers

Loch, D., & Ehiasarian, A.P. (2015). Nickel Coatings by Inductively Coupled Impulse Sputtering (ICIS). Society of Vacuum Coaters 57th (2014) Annual Technical Conference Proceedings. http://doi.org/10.14332/svc14.proc.1827

Loch, D., & Ehiasarian, A. (2012). A novel sputtering technique: Inductively Coupled Impulse Sputtering (ICIS). IOP Conference Series: Materials Science and Engineering, 39 (012006). http://doi.org/10.1088/1757-899X/39/1/012006

Posters

Shukla, K., Purandare, Y., Loch, D., Sugumaran, A., Kahn, I., Ehiasarian, A., & Hovsepian, P. (2020). Low-Pressure Plasma Nitriding Of Medical Grade Alloy Using HIPIMS Discharge. Presented at: I2RI Winter Poster Session, Virtual, 2020

Shukla, K., Purandare, Y., Loch, D., Sugumaran, A., Kahn, I., Ehiasarian, A., & Hovsepian, P. (2020). Low-Pressure Plasma Nitriding Of Medical Grade Alloy Using HIPIMS Discharge. Presented at: I2RI Winter Poster Session, Virtual, 2020

Shukla, K., Purandare, Y., Loch, D., Sugumaran, A., Kahn, I., Ehiasarian, A., & Hovsepian, P. (2020). Low-Pressure Plasma Nitriding Of Medical Grade Alloy Using HIPIMS Discharge. Presented at: I2RI Winter Poster Session, Virtual, 2020

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