Daniel graduated from the Jade University of Applied Sciences in Wilhelmshaven, Germany, as Dipl.-Ing. (FH) in Mechatronics in 2009. After writing his diploma thesis on modulated pulse plasma technology at the Fraunhofer Institute for Surface Technology (IST) in Braunschweig, Germany, he joined Sheffield Hallam University to work on the development of a novel pulsed plasma source. He was awarded the Joint SHU-Fraunhofer IST Research Centre Award in 2016.
Daniel is part of the National HIPIMS Technology Centre where he obtained a PhD in Plasma Science and Materials Engineering in 2015. Prior to joining SHU he received his degree as Diplom Ingenieur (FH) in Mechatronics from the Jade University of Applied Sciences in Wilhelmshaven in 2009. He wrote his diploma thesis on reactive plasma process development with modulated pulse plasma technology at the Fraunhofer Institute for Surface Technology (IST) in Braunschweig, Germany.
During his time at SHU he has been developing and characterizing a novel PVD sputtering technique, Inductively Coupled Impulse Sputtering (ICIS). This new highly ionised sputtering technology has shown very promising results for the deposition of magnetic coatings into high aspect ratio structures which are particularly of interest for MagMEMS devices and sensors.
Daniel utilizes Plasma Sampling Mass Spectroscopy (MS) and Optical Emission Spectroscopy (OES) to analyse the plasma composition and Scanning Electron Microscopy (SEM), Energy Dispersive X-ray Spectroscopy (EDX), Raman Spectroscopy, Secondary Ion and Neutral Mass Spectroscopy (SIMS/SNMS) and Profilometry to characterize thin film properties.
In 2016 he received the Joint SHU-Fraunhofer IST Research Centre Award for his work in developing ICIS processes and investigating the plasma properties of ICIS generated plasma.
- Highly ionized pulse plasma technology
- Magnetic thin films
- Electrically insulating coatings
- Thin Films Research Centre
- Materials and Engineering Research Institute
Loch, D., & Ehiasarian, A. (2017). Study of the Effect of RF-power and process pressure on the morphology of copper and titanium sputtered by ICIS. Surface and coatings technology, 327, 200-206. http://doi.org/10.1016/j.surfcoat.2016.10.018
Biswas, B., Purandare, Y., Arunachalamsugumaran, A., Loch, D., Creasy, S., Khan, I., ... Hovsepian, P. (2017). Defect growth in multilayer chromium nitride/niobium nitride coatings produced by combined high power impulse magnetron sputtering and unbalance magnetron sputtering technique. Thin Solid Films, 636, 558-566. http://doi.org/10.1016/j.tsf.2017.06.027
Loch, D., Aranda Gonzalvo, Y., & Ehiasarian, A. (2017). Plasma analysis of Inductively Coupled Impulse Sputtering of Cu, Ti and Ni. Plasma Sources Science and Technology, 26 (6). http://doi.org/10.1088/1361-6595/aa6f79
Loch, D.A.L., Gonzalvo, Y.A., & Ehiasarian, A.P. (2015). Nickel coatings by Inductively Coupled Impulse Sputtering (ICIS). Surface and coatings technology, 267, 98-104. http://doi.org/10.1016/j.surfcoat.2014.11.029
Hovsepian, P., Arunachalamsugumaran, A., Purandare, Y., Loch, D., & Ehiasarian, A. (2014). Effect of the degree of high power impulse magnetron sputtering utilisation on the structure and properties of TiN films. Thin Solid Films, 562, 132-139. http://doi.org/10.1016/j.tsf.2014.04.002
Lewin, E., Loch, D., Montagne, A., Ehiasarian, A.P., & Patscheider, J. (2013). Comparison of Al–Si–N nanocomposite coatings deposited by HIPIMS and DC magnetron sputtering. Surface and coatings technology, 232, 680-689. http://doi.org/10.1016/j.surfcoat.2013.06.076
Loch, D., & Ehiasarian, A. (2012). A novel sputtering technique: Inductively Coupled Impulse Sputtering (ICIS). IOP Conference Series: Materials Science and Engineering, 39 (012006). http://doi.org/10.1088/1757-899X/39/1/012006