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HIPIMS process development, plasma diagnostics and pilot production

We tailor HIPIMS-based treatment processes to suit applications on today's market.

We commercialise HIPIMS-based processes for deposition of metals, carbon, nitrides, oxides, carbonitrides and for substrate pretreatment. The development is informed by a number of plasma characterisation techniques including

  • optical emission spectroscopy
  • energy-resolved mass spectroscopy
  • Langmuir probes
  • atomic absorption spectroscopy
  • retarding field analysers
  • deposition rate monitors
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