We tailor HIPIMS-based treatment processes to suit applications on today's market.

We commercialise HIPIMS-based processes for deposition of metals, carbon, nitrides, oxides, carbonitrides and for substrate pretreatment. The development is informed by a number of plasma characterisation techniques including

• optical emission spectroscopy
• energy-resolved mass spectroscopy
• Langmuir probes
• atomic absorption spectroscopy
• retarding field analysers
• deposition rate monitors