Ellipsomtry can be used to measure film thickness, roughness, optical constant (refractive index and extension coefficient (K) of coating.
Ellipsometry is an optical method based upon the registration of changes in polarization of light reflected from the investigated sample. The state of polarization is described by two ellipsometric parameters Ψ and ∆ representing, respectively, the amplitude ratio and phase shift between p- and s-components of polarized light. Ellipsometery can be used of the measurement of the thickness and the optical properties(extinction coefficient) of surfaces and refractive index of thin films.
Spectroscopic Ellipsometery instruments operating on the rotating on the analyzer principle such as M2000V, J.A. Woollam, spectroscopic operating in the 370 – 1000 nm wavelength range.
The material and Engineering Research institute is equipped with an ellipsometer device mad by J.A.Wioollam co.,Inc. (United States), The M-2000 delivers both speed and accuracy, fast measurement less than 1 sec, 0 – 1000 nm thickness.
Ellipsometry is very important in our research and consultancy project. The main applications of ellipsometry are:
- Measuring the thin film thickness(up to 1µm).
- Measuring the optical constants (n and k).
- High accuracy for single and multiple layer thin film structure.
- Characterization of multi-layer semiconductor structures.
- Biosensors study
- Biotechnology applications
- Characterizations of thickness and surface roughness thin films
Who to contact
For more information about an ellipsometer please contact us on 0114 225 3500 or at MERI@shu.ac.uk.