Electronic Materials
Our electronic materials characterisation facilities include
- electrical characterisation facilities including current-voltage and capacitance-voltage measurements and sheet resistance measurements
- structural characterisation by high resolution scanning electron microscopy and transmission electron microscopy, both with energy dispersive X-ray analysis capabilities
- a high resolution Deep Level Transient Spectroscopy setup which can examine low concentrations of electrically active defects in both wide and narrow bandgap crystalline materials
- photoluminescence with an Ar ion laser for probing optically active defects and/or electronic band structure
- X-ray diffraction for strain measurements
- X-ray florescence
- atomic force microscopy for surface analysis
- optical characterisation of thin films with spectroscopic ellipsometry, SPR, UV-vis absorption and fluorescent spectroscopy