We tailor HIPIMS-based treatment processes to suit applications on today's market.

We commercialise HIPIMS-based processes for deposition of metals, carbon, nitrides, oxides, carbonitrides and for substrate pretreatment. The development is informed by a number of plasma characterisation techniques including

• optical emission spectroscopy
• energy-resolved mass spectroscopy
• Langmuir probes
• atomic absorption spectroscopy
• retarding field analysers
• deposition rate monitors

Whether developing new processes or optimising existing technology, plasma diagnostics saves time, cuts costs and reduces resource expenditure. It probes the process itself and is the fastest way to reveal key parameters and their influence on the final product.

For more information and enquiries please contact Professor Arutiun Ehiasarian.