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High Power Impulse Magnetron Sputtering is a technology which uses short, very high power pulses to apply protective coatings to a range of different surfaces

We are delighted to announce that this year's Jeremy Laskowski prize for excellence in PhD research has been awarded to Osama el Sherif

MERI is renowned for the development of nanoscale multilayer Physical Vapour Deposited (PVD) coatings and for the development of the HIPIMS technique

High Power Impulse Magnetron Sputtering is the latest development in PVD coating deposition technology

The project involved the development of a nitriding process to work at low pressures, achieving high plasma densities and degree of activation of nitrogen

Ti-Al-Si-N and Cr-Al-Si-N are high-temperature resistant coatings for cutting tool applications, created in collaboration with University of Freiberg, Germany

To meet continuous demands for improved performance of the state of art hard coatings for tribological applications it is necessary to incorporate novel plasma assisted deposition technology into the present coating equipment providing better control over the energy of film forming species

High Power Impulse Magnetron Sputtering (HIPIMS) has been developed on rotating PVD magnetron sources for uniform deposition on 200mm single wafer tools for barrier and seed layer deposition in through silicon vias (TSV)

Licensed process for the upscaling and implementation of High Power Impulse Magnetron Sputtering technology for the deposition of hard coatings

As part of an ongoing programme of fundamental studies, the plasma produced during the coating cycle is being studied in an attempt to link plasma properties to physical film properties