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Licensed process for the upscaling and implementation of High Power Impulse Magnetron Sputtering technology for the deposition of hard coatings

We offer a complete coating development package giving a choice of composition, architecture (monolayer or multilayers) and PVD deposition techniques to suit specific needs

Inductively Coupled Impulse Sputtering (ICIS) – ionised sputtering without magnetic field for deposition of magnetic materials and alloys

We tailor HIPIMS-based treatment processes to suit applications on today's market and commercialise HIPIMS-based processes for deposition of metals, carbon, nitrides, oxides, carbonitrides and for substrate pretreatment.

Adapt and expand the capability of existing of plasma diagnostic techniques to the environment of the HIPIMS discharge

The surface of metallic substrate is engineered by plasma cleaning to remove contamination and metal ion implantation to enhance wetting of the subsequent coating layer

Arc discharges are used for pretreatment of substrates prior to coating deposition

Papers available for the Interface micro structure engineering by high power impulse magnetron sputtering for the enhancement of adhesion

We have comprehensive expertise in HIPIMS pretreatment and coating technology. Our deposition systems are available for pilot industrial scale production, process development, test of concept and fundamental research.