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From 1999-2002, the Raman Spectroscopy of PVD Coatings project aimed to develop a Raman based method of monitoring the quality of coatings produced by the Surface Engineering Group and monitor stress and wear induced changes in hard coatings

We offer a complete coating development package giving a choice of composition, architecture (monolayer or multilayers) and PVD deposition techniques to suit specific needs

Inductively Coupled Impulse Sputtering (ICIS) – ionised sputtering without magnetic field for deposition of magnetic materials and alloys

We tailor HIPIMS-based treatment processes to suit applications on today's market and commercialise HIPIMS-based processes for deposition of metals, carbon, nitrides, oxides, carbonitrides and for substrate pretreatment.

The surface of metallic substrate is engineered by plasma cleaning to remove contamination and metal ion implantation to enhance wetting of the subsequent coating layer

Adapt and expand the capability of existing of plasma diagnostic techniques to the environment of the HIPIMS discharge

Papers available for the Interface micro structure engineering by high power impulse magnetron sputtering for the enhancement of adhesion

Arc discharges are used for pretreatment of substrates prior to coating deposition

We have comprehensive expertise in HIPIMS pretreatment and coating technology. Our deposition systems are available for pilot industrial scale production, process development, test of concept and fundamental research.

Arutiun is one of the pioneers of high power impulse magnetron sputtering (HIPIMS) technology.