News
Sheffield Hallam University is set to deliver world class research and innovation capability to drive next generation physical vapour deposition (PVD) processing following major investment in full digitisation of equipment and technology.
Coatings Analysis
We offer a complete coating development package giving a choice of composition, architecture (monolayer or multilayers) and PVD deposition techniques to suit specific needs.
The National HIPIMS Technology Centre
High Power Impulse Magnetron Sputtering is the latest development in PVD coating deposition technology
Coating characterisation and testing
Evaluation of coating performance in standardised tests allows realistic comparisons to state of the art. It is essential for quality control
ALTiCUT - Novel HIPIMS deposited TiAlCN/VCN Nanoscale Multilayer PVD Coatings Dedicated to Machining of Al and Ti Alloys and MMC Materials
Innovative processes and materials to synthesize knowledge-based ultra-performance nanostructured PVD thin films on gamma titanium aluminides
P+CVD
Nowadays, coatings with good wear and corrosion resistance consist in high thickness Ni or hard Cr coatings from electrochemical processes
Plasma Investigations of the HIPIMS Discharge Industrial funding
High Power Impulse Magnetron Sputtering (HIPIMS) has been developed on rotating PVD magnetron sources for uniform deposition on 200mm single wafer tools for barrier and seed layer deposition in through silicon vias (TSV)
Yashodhan Purandare
Yashodhan joined the Nanotechnology Centre for PVD Research in October 2006 as a postdoctoral researcher
Development of a new coating technology
IonBond AG worked with Sheffield Hallam University's Materials and Engineering Research Institute (MERI), to offer a new generation of coating systems
Professor Arutiun Ehiasarian
Arutiun is one of the pioneers of high power impulse magnetron sputtering (HIPIMS) technology.