High Power Impulse Magnetron Sputtering is the latest development in PVD coating deposition technology

MERI is renowned for the development of nanoscale multilayer Physical Vapour Deposited (PVD) coatings and for the development of the HIPIMS technique

The surface of metallic substrate is engineered by plasma cleaning to remove contamination and metal ion implantation to enhance wetting of the subsequent coating layer

We have comprehensive expertise in HIPIMS pretreatment and coating technology. Our deposition systems are available for pilot industrial scale production, process development, test of concept and fundamental research.

Adapt and expand the capability of existing of plasma diagnostic techniques to the environment of the HIPIMS discharge

Inductively Coupled Impulse Sputtering (ICIS) – ionised sputtering without magnetic field for deposition of magnetic materials and alloys

We tailor HIPIMS-based treatment processes to suit applications on today's market and commercialise HIPIMS-based processes for deposition of metals, carbon, nitrides, oxides, carbonitrides and for substrate pretreatment.

Arc discharges are used for pretreatment of substrates prior to coating deposition

Papers available for the Interface micro structure engineering by high power impulse magnetron sputtering for the enhancement of adhesion

We offer a complete coating development package giving a choice of composition, architecture (monolayer or multilayers) and PVD deposition techniques to suit specific needs